Tantalum Sputtering Target
1,In accordance with ASTM B521
2,Purity: Ta 99.95% min.
3,Surface Condition: ground
4,Shape: rectangle, circular, rotatable
5,Standard: ASTM B 521-98
6,Brand: RO5200,RO5400,RO5252,RO5255
7.Size: Outside Diameter:1.0~100mm
Wall Thickness: 0.2~5mm
Length: 200~600mm
Tantalum sputtering target
Construction for rectangle target: single piece or multiple pieces with butt or beveled jointed
Competitive pricing, stable quality, quick delivery
Chemical Element (weight %, max.) |
UNS | Type | C | O | N | H | Nb | Fe | Ti | W | Mo | Si | Ni | Ta |
R05200 | Pure Ta | 0.01 | 0.015 | 0.01 | 0.0015 | 0.04 | 0.005 | 0.002 | 0.01 | 0.01 | 0.005 | 0.002 | Bal. |
R05255 | Ta90-W10 | 0.01 | 0.015 | 0.01 | 0.0015 | 0.04 | 0.005 | 0.002 | 9.0-11.0 | 0.01 | 0.005 | 0.002 | Bal. |
R05252 | Ta97.5-W2.5 | 0.01 | 0.015 | 0.01 | 0.0015 | 0.04 | 0.005 | 0.002 | 2.0-3.5 | 0.01 | 0.005 | 0.002 | Bal. |
Hengxin metal supply kinds of metal & alloy sputtering target for various industries in a wide range of shapes and sizes.
metals & alloys
Chromium
Hafnium
Molybdenum, Mo-Nb, Mo-Ti, Mo-W
Nickel, Ni-Cr, Ni-V
Niobium, Nb-Ti, Nb-Zr
Tantalum, Ta-W
Titanium, Ti-Al, Ti-Cr, Ti-Cu, Ti-Pd
Tungsten, W-Ag, W-Re
Zirconium, Zr-Ti
Purity: 99%-99.999%, dependant on different materials
Shape and form:
Square, rectangle, circular, triangular, rotatable
Single piece or multiple pieces construction. Jointed by butt or beveled for multi-segmented targets.
OEM design available
Surface and tolerance:
Precision fabricated and grounded. Roughness Ra 0.8-Ra 3.2 for target surface
Process:
HIP, Vacuum melting or Press-sintered. Dependant on different materials and application.
Typical application:
Flat Panel Displays, Optical Discs, Automotive & Architectural Glass, WEB Coating, Decorative, Hard Coatings, Solar Cells, Magnetic Data Storage Devices, Semiconductors, Optical Communications, Electron Microscopy