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    86-0917-6739169,6739232

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    High-Tech 10th Rd., Hi-Tech Zone, Baoji, Shaanxi, China (Mainland)

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LatestProducts

                            Tantalum Sputtering Target

Tantalum Sputtering Target

Tantalum Sputtering Target,BJHX,Metallurgy, Chemicals,Minerals & Metallurgy,Other Metals & Metal Products
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Description

Overview
Quick Details
Brand Name:
BJHX
Model Number:
BJHX
Application:
sputtering
Shape:
tube
Material:
Ta1 Ta2
Dimensions:
ASTM B 521-98
Chemical Composition:
Ta,N,H,O.C
Packaging & Delivery
Packaging Details
according to customer's request
Delivery Time
within 30 days from the order date

Specifications

Standard: ASTM B 521-98
Brand: RO5200,RO5400,RO5252,RO5255
Size: :OD,1.0~100mm, 0.2~5mm,200~600mm

 

Tantalum Sputtering Target

1,In accordance with ASTM B521

2,Purity: Ta 99.95% min.

3,Surface Condition: ground

4,Shape: rectangle, circular, rotatable

5,Standard: ASTM B 521-98

6,Brand:   RO5200,RO5400,RO5252,RO5255

7.Size:     Outside Diameter:1.0~100mm

             Wall Thickness: 0.2~5mm

             Length:        200~600mm

 

 

Tantalum sputtering target

 

 

 

 

Construction for rectangle target: single piece or multiple pieces with butt or beveled jointed

 

Competitive pricing, stable quality, quick delivery

 

 

 

Chemical Element (weight %, max.)

UNS

Type

C

O

N

H

Nb

Fe

Ti

W

Mo

Si

Ni

Ta

R05200

Pure Ta

0.01

0.015

0.01

0.0015

0.04

0.005

0.002

0.01

0.01

0.005

0.002

Bal.

R05255

Ta90-W10

0.01

0.015

0.01

0.0015

0.04

0.005

0.002

9.0-11.0

0.01

0.005

0.002

Bal.

R05252

Ta97.5-W2.5

0.01

0.015

0.01

0.0015

0.04

0.005

0.002

2.0-3.5

0.01

0.005

0.002

Bal.

 

 

 

Hengxin  metal supply kinds of metal & alloy sputtering target for various industries in a wide range of shapes and sizes.

 

 

 

metals & alloys

 

 

Chromium

 

 

Hafnium

 

Molybdenum, Mo-Nb, Mo-Ti, Mo-W

 

Nickel, Ni-Cr, Ni-V

 

Niobium, Nb-Ti, Nb-Zr

 

Tantalum, Ta-W

 

Titanium, Ti-Al, Ti-Cr, Ti-Cu, Ti-Pd

 

Tungsten, W-Ag, W-Re

 

Zirconium, Zr-Ti

 

 

 

Purity: 99%-99.999%, dependant on different materials

 

 

 

Shape and form:

 

Square, rectangle, circular, triangular, rotatable

 

Single piece or multiple pieces construction. Jointed by butt or beveled for multi-segmented targets.

 

OEM design available

 

 

 

Surface and tolerance:

 

Precision fabricated and grounded. Roughness Ra 0.8-Ra 3.2 for target surface

 

 

 

Process:

 

HIP, Vacuum melting or Press-sintered. Dependant on different materials and application.

 

 

 

Typical application:

 

Flat Panel Displays, Optical Discs, Automotive & Architectural Glass, WEB Coating, Decorative, Hard Coatings, Solar Cells, Magnetic Data Storage Devices, Semiconductors, Optical Communications, Electron Microscopy

 

Tantalum Sputtering Target